Investigation of surface properties from the nanometer to the micrometer scale. Kenneth marcus s in any form of chemical analysis, the quality of information obtained from a depth profiling experiment is only as. In all types of ion sources, the gas ions are produced by various types of gas discharge including electron collisions with gas atoms. In the experiments used a magnetron with a diameter of 12. In a first attempt, i fastened two screws into an insulating peek piece, as shown in the picture. All results shown have been normalized to the higher 56. Use features like bookmarks, note taking and highlighting while reading glow discharge processes. Abstract new pulse dc power supplies for magnetron sputtering devices give ample opportunities in realization of vacuum technologica l processes. The sputtering rate depends on the ratio of the mass of the bombarding molecules and the mass of the cathode material. Feasibility of electroplating chromium onto titanium was demonstrated through the use of glow discharge sputtering techniques. The general requirements are a source of electrons, a small region. Further the data of the 3d crater are saved in ascii format and opened.
Gds850a glow discharge spectrometer leco glow discharge atomic emission spectrometers gdaes are the clear choice of leading companies around the world, providing the most accurate bulk analysis, as well as quantitative depth profiling for a wide. If the sputtering rate is faster than the chemical reaction rate, then the reaction will take place on the substrate. The abnormal glow discharge is observed at high values of j. The 1d and 2d models show how to use the dc discharge interface to set up an analysis of a positive column. Also the sputtering yield is determined using the experimental results for nitrogen and argon gases on stainless steel material target. The preparation of substrates for film deposition using glow discharge techniques.
The depth files of the films were measured using glow discharge optical emission spectroscopy gdoes, model jy5000rf, gdprofiler2, horiba co. The ion plating process can be implemented in one of two major forms. But it is most famous as a source of light in different gas discharge tubes. Tutorial on properties of thin film layers for optical. In order to be able to draw profound conclusions from gdoes profiles, one has to optimize the measurement conditions for the given application as well as to ensure the suitability of the used emission lines. Radio frequency glow discharge optical emission spectroscopy depth profiling analysis of thin anodic alumina films as potential reference materials k. The drawback of the dc glow discharge is the low sputtering power efficiency, which is decreasing with increasing energy. It is characterized by a rapid increase in the voltage between the electrodes as the current is increased. Sputtering and secondary electron emission september 08 iii. Sputtering and ionization by helium and argon in the. The behavior of low pressure dc electrical discharges in gases was studied by many english and german physicists during the 19th century. The induction of the dynamic magnetic field b with a component parallel to the cathode of the source exceeds the value of 30. Sputtering discussion illplaced and missing content. Glow discharge article about glow discharge by the free.
Multiple steady states in a radio frequency chlorine glow discharge eray s. High power pulsed magnetron sputtering hppms is a stateoftheart physical vapor deposition technique with several industrial applications. K350 attachment sputter coatingglow discharge instruction manual for technical and applications advice plus our online shop for spares and consumable parts visit. This work focuses on the spatial and temporal characteristics of a glow discharge plasma operated with power pulses of 5 ms in duration at 25% duty cycle. Comparison of glow discharge cleaning 1233 clined 42. Adjust gas flow to get good stochiometry chemical composition. The simplest source of ions for sputtering is provided by the wellknown phenomenon of glow discharge due to an applied electric field between two electrodes in a gas at low pressure. Chapter 2 the glow discharge um students repository. Gas molecules are ionized in a glow discharge plasma, ions strike target and remove mainly neutral atoms.
The difficulty in estimation of nuclear and nonnuclear processes contribution in isotopic and elemental composition. Glow discharge mass spectrometers, which are commercially available with fast and sensitive electrical ion detection, allow direct trace elemental determination in solid materials with good sensitivity and precision in the concentration range lower than ng g1. Interpretation of emission data provides insight into the nature of the plasma at each instant of a typical pulse cycle and at each position in space. Leco glow discharge optical emission spectrometry gdoes. Preheating and glow discharge pretreatment planar or rotating targets dc, dc pulsed, ac, bipolar pulsed power supplies insitu spectral photometer for transmission and reflection. If the sputter yield of one species a is larger than the other b, then the surface will initially be depleted of a. Glow discharge spectroscopy gds is a direct analysis technique used to measure the elemental concentrations of solid materials. Glow discharge mass spectrometry in nuclear research. Glow discharge in a lowpressure tube caused by electric current. Glow discharge sputtering means the energetic particles used to strike target is generated by glow discharge. Ion plating is a vacuum evaporation process assisted by a glow discharge. Radio frequency glow discharge optical emission spectroscopy. Dc discharges are attractive to study because the solution is time independent.
The basic operating mechanism section should describe only the physics important for the discharge. Ante hecimovic magnetron discharges 20th european summer school, bad honnef 2016 dc discharge magnetron the. Two independent electrical signals from the discharge are required for quantification. The problems of reproducibility of experiments in glow discharge gd and electrolysis are considered. When sputtering insulating samples, the voltage over the discharge is not directly measurable. However, sputtering is not desirable when glow discharge is used for lighting, because it shortens the life of the. An electric glow discharge is a plasma formed by the passage of current at 100 v to several kv through a gas, often argon or another noble gas. Each of the substrates is provided on the ground electrodes which are placed over each of the rfelectrodes in parallel to each other. Previous work using panels demonstrated the use of these techniques to clean titanium and sputter cover with chromium. Transition mode reactive sputtering by plasma emission. Glow discharge optical spectroscopy for sputtering diagnostics welcome to the ideals repository.
The target can be powered in different ways, ranging from dc for conductive targets, to rf for nonconductive targets, to a variety of different ways of applying current andor voltage pulses to the target. Direct current magnetron glow discharge plasma characteristics study for controlled deposition of titanium nitride thin film. Plasma physics page 3 plasma properties plasma density n number of speciescm3 107 1020 typical glow discharges and arcs have an electron and ion density 108 1014 dr. Figure 28 sho m two possible paths for an incident ion in a glow discharge upon application of the discharge voltage. The region between a and e on the voltagecurrent characteristics is termed a dark discharge, because the discharge remains nearly invisible to the eye. To help the ion source produce this current, a dc, glowdischarge plasma gun was designed using coupled fluid dynamic, heat transfer, mechanical stress and deformation, and ionelectron trajectory simulations. Treats glow discharge at several levels from basic phenomena to industrial applicationspractical techniques diligently related to fundamentals. Glow discharge optical emission spectrometry gdoes is a widely used tool for fast measurements of depth profiles. This allows the user to configure the system as a sputter coater, evaporator or glow discharge system all in one space saving format. Jun 11, 2005 radio frequency glow discharge optical emission spectroscopy rfgdoes is routinely used for the chemical analysis of solid samples. The cathode surface of a discharge tube was sputtered by energetic ions and deposited on the inner walls of the tube. Denton desk iv sputter university of north carolina at. This results in the decomposition of the gas molecules.
Glow discharge optical emission spectroscopy is a rapid direct analysis technique for surfaces and interfaces of solid materials, both conducting and insulating. Jacksonb adepartment of chemistry, university of antwerp, universiteitsplein 1, b2610 wilrijk antwerp, belgium. Surface bonds might be activated setting up a surface that initiates the nucleation of reactive compounds. The effect of glow discharge sputtering on the analysis of metal oxide films. Simple ion plating involves evaporation of coating materials usually a metal like aluminum or gold into a dc or rf supported glow discharge. Fabrication of tantalum nitride thin film using the 2 low. Growth and characterization of hydrogenated amorphous. A glow discharge is a plasma formed by the passage of electric current through a gas. Physics of glow discharge plasmas and plasmasurface. The gas breaks down to conduct electricity when a certain minimum voltage is reached.
The discharge characteristics of the glow discharge ion source such as, discharge voltage, discharge current and output ion beam current are investigated using nitrogen and argon gases. Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. In case of application of the dc plasma jet for the deposition of oxides by reactive sputtering of metallic nozzles, the use of dc pulse plasma excitation is very useful. Gdoes employs a capacitively coupled low pressure glow discharge, where the sample is used as the. Production r2r sputtering 2m substrate width 6 cathodes per drum. Selecting this option will search all publications across the scitation platform selecting this option will search all publications for the publishersociety in context. Uses glow discharge to transfer energy to a gas mixture. The whole paragraph on sputtering of the cathode is illplaced in my view.
Pvd sputtering glow discharge and plasmas dc glow discharges discharge species collision processes. One argument for the incident nature of ions is illustrated in the picture of a glow. Study of plasma and ion beam sputtering processes 1 the conversion of neutral particles into ions, electrons plasma. The coupling capacity of the sample is required in order to calculate the. Glow discharge is similar to sputtering, but instead of ions from the plasma ejecting the material from the target, a chemical reaction is initiated in the gas phase by creating a radio frequency glow discharge of the reactant gas, leading to the deposition of the solid form on a substrate placed inside a chamber. To improve the analytical results of techniques that use the glow discharge as spectroscopic source, a good insight into the glow discharge is desirable. Comparison of glow discharge cleaning and ionimpact.
Also the sputtering yield has been determined using the experimental results for nitrogen and argon gases on stainless steel material target. Glow discharges are used in a large number of application. In this report, the initial design, simulations results, and experimental data will be discussed. Low pressure glow discharge plasmas are today frequently used in materials processing. Detachable chamber with builtin implosion guard removable glass chamber and easily accessible base and top plate allows for an easy cleaning process.
A glow discharge decomposition apparatus comprises ground electrodes, substrates, rfelectrodes, a rfpower supply, a matching circuit and a controlling circuit having at least one electric element. Rf sputtering dc sputtering does not work with dielectric materials. Glow discharge ion source, sputtering yield, argon gas pressure, plasma production. Perhaps the simplest sputtering technique is the dc diode. The low temperature plasma jet sputtering systems applied. The effects of glow discharge cleaning g dc and ionimpact desorption lid of impurities on. Pdf direct current magnetron glow discharge plasma. The number of sputtered titanium molecules is proportional to the pressure inside the pump.
The low temperature plasma jet sputtering systems 9 system is optimal to operate in the range of pressures in the reactor from 0. However, sputtering is not desirable when glow discharge is used for lighting, because it shortens the life of the lamp. Q150t sees sample preparation system instruction manual 10473 issue 6 for technical and applications advice plus our online shop for spares and consumable parts visit. Almost all elements present in a solid sample, including carbon, can be detected and routinely quanti. Department of materials science and engineering university. The higher this ratio, the higher is the sputtering rate. One of the main disadvantages of this process is its. Electrical and morphological properties of low resistivity. The element gd, a combination of a glow discharge ion source with a high resolution mass spectrometer, is the ultimate tool for the direct analysis of conductive materials.
The development of direct and alternating current glow. Q150t sees sample preparation system instruction manual. High energy transferred to the surface might physically scour condensed contaminants or chemically alter them. The simulator utilizes a variable source code configuration, which allows the. Other readers will always be interested in your opinion of the books youve read.
Download it once and read it on your kindle device, pc, phones or tablets. Multiple steady states in a radio frequency chlorine glow. Dc glow discharges in the lowpressure regime have long been used for gas lasers and fluorescent lamps. Rack plasma physics page 4 dc glow discharge before application of the potential, gas molecules are electrically neutral and. Within this part the current density is rather low 106a. Study of ion beam sputtering using a glow discharge ion source. Pdf glow discharges are used in a large number of application fields.
Nov 30, 2010 glow discharge applications glow discharge is used in a variety of scientific and technical fields. The preparation of substrates for film deposition using glow. A carbon cord evaporation insert is available as an option. Sputtering and plasma etching kindle edition by chapman, brian. This option allows users to search by publication, volume and page selecting this option will search the current publication in context. Characterization of low pressure plasmadc glow discharges. Thin film 2016c5 sputtering, plasma and ion beam processing of thin films nov. Technische universitat dresden study in analytical glow. Bulk plasma properties in the pulsed glow discharge. Glow discharge optical spectroscopy for sputtering diagnostics. This popular technique forms the focus of this chapter. Glow discharge optical spectroscopy gdos is a technique used for measuring impurity concentration pro files in semiconductors, specifically annealed and unannealed ion implanted gallium arsenide gaas. Surface cleaning by glow discharge in a highvolume gas flow.
Investigation of the afterpeak annemie bogaerts,a renaat gijbelsa and glen p. Economoua department of chemical engineering, university of houston, houston, texas 772044792 received 4 june 1990. Growth and characterization of hydrogenated amorphous silicon thin films martin k. For example, sputter deposition and other ion assisted growth. Methods to improve the sensitivity of the gdos system have been investigated.
Pdf the effect of glow discharge sputtering on the. Radio frequency glow discharge source with integrated voltage. Now, since the surface has more of b, more of it will sputter off. Many elements can be analyzed down to the ppt parts per trillion. Whether youve loved the book or not, if you give your honest and detailed thoughts then people will find new books that are right for them. A special type of glow discharge can be obtained with a hollow cathode a cathode consisting of a hollow cylinder or two parallel plates. Sputtering of the cathode, on the other hand, is not at all important for a glow discharge. Sputtering and secondary electron emission chapter iii. Mini coater and carbon attachment makes the ideal lowcost sem sputtering and carbon coating system package. Sputtering hipims high power impulse a high current, low magnetron sputtering voltage electric arc is used to vaporize and ionize target material which is then attracted to a biased substrate. K350 attachment sputter coatingglow discharge instruction.
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